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Product Name | Alumina(Al₂O₃) | Aluminum Nitride(AlN) | Sapphire |
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Product Description | Used in core parts of semiconductors due to high strength and resistance against wear and heat | High heat conductivity and electrical insulation, as well as outstanding resistance against thermal shock and plasma | Material with higher strength than Al₂O₃ by refining high purity Al₂O₃ |
Application | Core parts inside the semiconductor chamber | Heat Sink, Base board, Soaking Plate for Heater | Parts for Etcher Process |
Product Type | Gas Inject, Window, Ring, Arm, etc. | Ring, Plate, Crucible | Window, Focus Ring, Injector |
Product Name | Silicon Pad | YAS | Si₃N₄ |
---|---|---|---|
Product Description | Used as heat or electrical onductive medium in etching equipment | Better plasma characteristics than Al₂O₃ products, and used by coating YAS material on the surface of products directly exposed to plasma | High electrical insulation and heat conductivity, and used as base for Probe Cards, Electric Power Semiconductor Modules, and Automobile Invertor Modules |
Application | Heat conduction parts within Etcher equipment | Semiconductor Dry Etching process | Probe Card Guide, Electric Power Semiconductor and Automobile Invertor |
Product Type | Thermal Pad | Window, ESC EDGE RING | Si₃N₄ Circuit Board |
Product Name | SiC Ring | Susceptor | SiC Boat |
---|---|---|---|
Product Description | Parts to maintain etching uniformity by keeping plasma consistent at the outer boundaries of the wafer |
Thin Film parts of wafer in Epi process |
Parts that safely position several wafers in order to coat thin oxide film during process |
Application | Etcher process | Thin Film process | CVD process, Diffusion process, etc. |
Type | Focus Ring, Insert Ring, Edge Ring (Hot, cool) |
8” / 12” Susceptor | Baffle Boat, 8” / 12” Long Boat |